Headlines 

• Solves Critical Transistor Scaling Challenge with New Millisecond Anneal System
• Releases the Industry’s Most Advanced, Productive CMP Platform – the Reflexion GT
• Smart Emissions Control Solution Cuts Energy Use, Cost in Semiconductor Fabs

Speakers

• Randhir Thakur, Senior Vice President, General Manager Silicon Systems
• Charlie Pappis, Corporate Vice President, General Manager Applied Global Services
• Bill McClintock, Corporate Vice President, General Manager Dielectric Systems and
  Chemical Mechanical Planarization Products
• Steve Ghanayem, Corporate Vice President, General Manager Metal Deposition and Front End Products

Multimedia

• Photo: Applied Reflexion GT CMP (hi-res / lo-res / caption)
• Photo: Applied Reflexion GT CMP (hi-res / lo-res / caption)
• Photo: Vantage Astra (hi-res / lo-res / caption)
• Photo: Vantage Astra (hi-res / lo-res / caption)
• Photo: iSYS (hi-res / lo-res / caption)
• Video: iSYS video

Resources

• Whitepaper: Bringing Efficiency to the Subfab (337KB, PDF)
• Backgrounder: Applied Reflexion GT CMP (32KB, PDF)
• Backgrounder: Applied Vantage Astra DSA (51KB, PDF)

For more information or executive interviews, send an e-mail to media_relations@amat.com.

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